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Patent Law for Engineers
|I.D.# 88007||Printable Description|
Upcoming open enrollment dates being scheduled. Please check back.
This information-packed seminar focuses on the intricacies of patents, patent infringement litigation and patent licensing. Attendees will explore the important subjects of obtaining U.S. and foreign patents, maintaining U.S. and foreign patent rights, enforcing patent rights, defending against patent rights asserted by competitors, and licensing patent rights for revenue. After this seminar, you will effectively understand patents and ways to protect your company's valuable inventions. Your new knowledge will help your company maintain and enhance its position in the marketplace.
By attending this seminar, you will be able to:
- Obtain an overview of U.S. patent litigation
- Understand the basic legal principles for liability and damages in patent cases
- Gain insights into how patent disputes are resolved
- Predict the fees and expenses associated with bringing and/or defending a patent case in the U.S.
- Anticipate the scope of discovery in, and/or business disruption arising from, a U.S. patent case
- Peek into the future of potential patent law reform
Who Should Attend
Participants should have a mid- to upper-level managerial role. Research and development, in-house legal staff members such as in-house lawyers, patent agents, or patent liaisons will especially benefit.
- Overview of Patent Litigation
- Issues the Patent-Owner Has to Prove
- Issues the Accused Infringer Has to Prove
- Who Decides Liability and Damages
- How Long Does it Take From Filing to Trial
- District Courts
- How Much Does It Cost
- Fees and expenses
- Contingency Fees
- Recovery of fees and expenses
- What is the Scope of Discovery
- Documents, including e-documents
- Third parties (e.g. customers, suppliers)
- Confidentiality of discovery materials
- What Changes are on the Horizon
- Supreme Court
- Patent law reform
Instructor(s): William Cory Spence
As the founding partner of Spence PC, Mr. Spence assists individual and business clients in obtaining their best possible outcome in contentious legal matters. He has experience in litigation, arbitration, and mediation involving all areas of intellectual property law. He has litigated claims in both state and federal courts throughout the United States. Additionally, Mr. Spence has experience with patent monetization strategies and complex, international patent infringement litigation involving multiple parties and jurisdictions, including Asia. He is a registered patent attorney and published author and frequent speaker on patent monetization and other intellectual property issues. Mr. Spence is a graduate of the University of Notre Dame, where he obtained separate Bachelor of Science Degrees in Chemical Engineering and Biophysics (“Physics in Medicine”), and a graduate of the University of Houston Law Center. Prior to forming Spence PC, Mr. Spence spent twelve years practicing law with Kirkland & Ellis LLP in Chicago, IL and Tokyo, Japan.
Fees: $810.00 ; SAE Members: $648.00 - $729.00
You must complete all course contact hours and successfully pass the learning assessment to obtain CEUs.
Testimonial"Excellent introductory training in patent law for all engineers. A 'must do' for all engineers."
"Excellent overview of these legal topics...felt like an accelerated day in the life of a law student."
Products Development MGP
Manager, Intellectual Property
Honeywell "Being an engineer in a research field, this course gave me the information I need to legally understand how and when my research can be disclosed and marketed."
Charles E. Roberts
Southwest Research Institute "Mr. Spence did a wonderful job explaining the basics of patent law for engineers."
Dr. Colin Jordan
Forensic Engineering Manager
Kimley-Horn & Associates
For additional information, contact SAE Customer Service at 1-877-606-7323 (724/776-4970 outside the U.S. and Canada) or at CustomerService@sae.org.
For a quote on bringing this course to your company site, fill out a Corporate Learning Solutions Request Form
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